发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND METHOD FOR PRODUCING SAME
摘要 A compound semiconductor (e.g., GaAs) IC device structure includes: a compound semiconductor substrate having a semi-insulating compound surface region; an active element laminated layer formed on the surface region; an isolation region of a semi-insulating (intrinsic) compound semiconductor which is filled in a groove extending into the surface region through the laminated layer; and active elements formed in regions of the laminated layer, isolated by the filled groove.
申请公布号 EP0180457(A3) 申请公布日期 1989.06.07
申请号 EP19850307819 申请日期 1985.10.29
申请人 FUJITSU LIMITED 发明人 OHSHIMA, TOSHIO;YOKOYAMA, NAOKI
分类号 H01L27/08;H01L21/20;H01L21/263;H01L21/76;H01L21/8222;H01L21/8252;H01L27/06;H01L27/082;H01L29/205;H01L29/737;H01L29/812;(IPC1-7):H01L21/76 主分类号 H01L27/08
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