首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
THERMAL DEVELOPING LIGHT-SENSITIVE MATERIAL
摘要
申请公布号
EP0256820(A3)
申请公布日期
1989.06.07
申请号
EP19870307044
申请日期
1987.08.07
申请人
KONISHIROKU PHOTO INDUSTRY CO. LTD.
发明人
KOHNO, JUNICHI;KOMAMURA, TAWARA;OKAUCHI, KEN
分类号
G03C1/498;(IPC1-7):G03C1/02
主分类号
G03C1/498
代理机构
代理人
主权项
地址
您可能感兴趣的专利
SOUNDPROOF CONSTRUCTION OF WORKING MACHINE
A method and system for dispensing a liquid photoimageable solder mask
Method for nucleic acid analysis using fluorescence resonance energy transfer
Apparatus and method for resistivity well logging utilizing nuclear magnetic resonance
Methods of treatment with compounds having raralpha receptor specific or selective activity
A cosmetic composition and a method for reducing the ageing process of skin
Microsystem module
System for confirming position of moving terminal
Thiazolidine and oxazolidine derivatives processes for the preparation thereof and pharmaceutical compositions containing the same
Process for stereo-selectively hydrolysing piperidine derivatives
BLEED VALVE
Simple process for producing high-quality captopril
GAME MACHINE
Nitration of aromatic compounds
Method for producing a polypeptide in a eukaryotic host cell and recombinant dna vectors containing an improved transcription control unit based on the adenovirus 2 major late promoter used thereto
A transdermal therapeutic composition a process for its preparation and use thereof
Method for the production of rdspa alpha1 pharmaceutical compositions containing the same and use thereof
Diagnosis and treatment of aur-1 and/or aur-2 related disorders
Human amyloid protein precursor homologue and kunitz-type inhibitors
Apparatus and method for editing photographs
