| 摘要 |
PURPOSE:To obtain the title composition outstanding in resolvability, developability, heat resistance, etc., suitable as a positive-type resist for making integrated circuits, also as that for making photomasks, by blending an alkali- soluble resin with a 1,2-quinonediazide compound. CONSTITUTION:The objective composition can be obtained by blending (A) 100 pts.wt. of an alkali-soluble resin [e.g., alkali-soluble novalak resin, polyhydroxystyrene (derivative)] with (B) 5-100 (pref. 10-50) pts.wt. of a 1,2- quinonediazide compound containing at least one kind of 1,2- naphthoquinonediazide sulfonate of hydroxybenzophenone derivative of formula I, II or III (2 is of formula IV, etc., R is 1-3C alkyl, etc., Q is H, etc.). |
