发明名称 STRUCTURE FOR HOLDING SPUTTERING TARGET
摘要 PURPOSE:To produce the title structure for holding a sputtering target free of cracking with a simple process by placing an oxide in the recess of a packing plate, vacuum-sealing the oxide, and compacting the oxide. CONSTITUTION:In the packing plate 1 made of copper and having the recess 2 provided with an O ring groove 3 and a bolthole 4, the recess 2 is separated into plural sections by a partition plate 6. The same or different oxides and/or the mixed powder 5 of oxides (e.g., BaO, CuO, Y2O3, etc.) are placed in each section, and the whole packing plate 1 is immediately vacuum-sealed 7. The packing plate 1 is compressed from the periphery by cold hydrostatic compression, etc., to compact the powder 5, and a compact is obtained. The holding structure free of cracking is obtained from the compact with a simple process without using a bonding material.
申请公布号 JPH01139760(A) 申请公布日期 1989.06.01
申请号 JP19870297778 申请日期 1987.11.27
申请人 JGC CORP 发明人 OSHIMA SHIGETOSHI;MATSUO EIJI
分类号 C23C14/34 主分类号 C23C14/34
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