| 摘要 |
<p>Process for providing improved solvent resistant surfaces of relief flexographic printing plates prepared by imagewise exposure and liquid development of the unexposed areas of a layer of photosensitive etastomeric composition comprising a high molecular weight butadiene/acrylonitrile copolymer and a monomeric compound wherein, optionally after drying, the developed surface is, in either order, (1) postexposed to actinic radiation, and (2) contacted with two successive aqueous halogen solutions, first, 0.01 to 3.5% by weight aqueous bromine solution for about 15 seconds to 20 minutes or 0.2 to 10% by weight aqueous iodine solution for about 1.0 to 10 minutes, followed by chlorine solution equivalent to that supplied by an aqueous solution, 0.01 to 1.0 molar in NaOCI and 0.012 to 1.2 molar in HCI, for about 15 seconds to 5 minutes.</p> |
