| 摘要 |
<p>PURPOSE:To inspect a shift of position of a color separation filter on a wafer quickly with high precision by using a main scale formed in a blank space of a semiconductor wafer and a vernier formed in a mask for forming a color separation filter in combination. CONSTITUTION:A main scale 1 is formed previously in a blank space of an upper surface of a semiconductor wafer with a vapor-deposited Al film, etc. All distances between centers of unit pattern are regulated to be xmum. On the other hand, a vernier 2 is formed so as to open in a mask for forming each color separation filter, and unit pattern of the vernier is formed to have a same breadth as the unit pattern constituting the main scale 1. If the graduation distance of the vernier is set, for example, at x+0.1mum, x-0.1mum, or x+0.2mum, x-0.2mum, a precision for registering a color separation filter can be controlled to 0.1mum or 0.2mum precision, respectively.</p> |
