| 摘要 |
<p>PURPOSE:To prevent light from leaking from a switching element by providing an overcoat and an transparent conductive film on a color filter, and forming photosensitive light-shielding resin at the gap position of the color filter without any need for alignment by using the color filter as a mask. CONSTITUTION:The color filter 5 is formed by electrodeposition on a patterned transparent electrode 4 formed on a glass substrate 2. This electrodeposited color filter substrate 5 is coated with transparent high polymer resin to form the overcoat layer 6, and the transparent conductive film 7 is formed then and coated with the photosensitive light-shielding resin uniformly. Then, the electrodeposited color filter 5 is used as the mask and the glass substrate 2 is irradiated with light from its back. Consequently, no light strikes on the photosensitive resin on the color filter 6 and only the photosensitive resin 8 at the gap part of the color filter 5 is exposed and left as a light shielding film 9 after development. Consequently, the light leak phenomenon of a thin film transistor as an active element is precluded.</p> |
