发明名称 JIG AND METHOD FOR INSPECTING OUTWARD APPEARANCE OF PHOTOMASK
摘要 <p>PURPOSE:To inspect the offset and rotational deviation of the photomask to be inspected easily in a short time by fixing an end part of a reference plate and supporting the photomask to be inspected opposite the plate surface of the reference plate. CONSTITUTION:The outward appearance inspecting jig consists of the reference plate 14 where a reference pattern corresponding to a pattern formed on the photomask 15 to be inspected is formed and a support member 11 which supports the reference plate 14 by fixing its end part and supports the photomask 15 to be inspected opposite the plate surface of the reference plate 14. Then, this outward appearance inspecting jig is used to compare the patterns of the reference plate 14 and object photomask 15 which are supported in parallel to each other to easily and securely detect the offset and rotational deviation of the pattern of the object photomask 15.</p>
申请公布号 JPH01138446(A) 申请公布日期 1989.05.31
申请号 JP19870296415 申请日期 1987.11.25
申请人 OKI ELECTRIC IND CO LTD 发明人 TOSAKA YASURO;MOROZUMI YOSHINOBU
分类号 G01N21/88;G01N21/93;G01N21/956;G03F1/00;H01L21/027;H01L21/30 主分类号 G01N21/88
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