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发明名称
PRETREATMENT EQUIPMENT FOR PHOTORESIST COATING
摘要
申请公布号
JPH01137630(A)
申请公布日期
1989.05.30
申请号
JP19870296352
申请日期
1987.11.25
申请人
NEC CORP
发明人
KAWAI KENJI
分类号
G03C1/00;B05B9/03;B05C11/08;G03F7/16;H01L21/027;H01L21/30
主分类号
G03C1/00
代理机构
代理人
主权项
地址
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