| 发明名称 |
Ion-projection apparatus |
| 摘要 |
An ion-projecting apparatus which has between the ion source and the mask, directly proximal to the mask, at least one ion optical correction element in the form of a multipole with at least eight poles and so located that there is no other deflection means between the octapole and the mask.
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| 申请公布号 |
US4835392(A) |
申请公布日期 |
1989.05.30 |
| 申请号 |
US19870123128 |
申请日期 |
1987.11.20 |
| 申请人 |
IMS IONEN MIKROFABRIKATIONS SYSTEME GESELLSCHAFT M.B.H. |
发明人 |
LOESCHNER, HANS;STENGL, GERHARD |
| 分类号 |
H01J37/08;H01J37/12;H01J37/147;H01J37/30 |
主分类号 |
H01J37/08 |
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