发明名称 Polysulfone barrier layer for bi-level photoresists
摘要 A photosensitive article which comprises a substrate, a first light sensitive layer on the substrate, a polysulfone layer and a second light sensitive layer. The first light sensitive layer preferably comprises a depolymerizable polymethyl methacrylate polymer and the second light sensitive layer preferably comprises on o-quinone diazide in admixture with a water insoluble, aqueous alkaline soluble binder resin.
申请公布号 US4835086(A) 申请公布日期 1989.05.30
申请号 US19880156353 申请日期 1988.02.12
申请人 HOECHST CELANESE CORPORATION 发明人 JAIN, SANGYA
分类号 G03F7/022;G03F7/039;G03F7/09;G03F7/095;G03F7/11;G03F7/26 主分类号 G03F7/022
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