发明名称 Matted radiation-sensitive recording material
摘要 <p>The invention relates to a recording material having a support (carrier, substrate, base), a radiation-sensitive layer containing a 1,2-naphthoquinone 2-diazide and an organic, polymeric binder which is insoluble in water, but soluble in aqueous-alkaline solutions, and a non-continuous matting layer located thereon. This matting layer comprises from 100 to 10000 particles per square centimetre having a mean diameter of less than 40 mu m and a maximum diameter of less than 80 mu m and a mean height from 2 to 6 mu m and a maximum height of 10 mu m which contain a resin containing up to 0.80 mmol of acid and/or salt groups per gram. The matting layer is obtained by spraying on and drying an aqueous, anionically or anionically/nonionically stabilised dispersion of the resin.</p>
申请公布号 EP0649063(B1) 申请公布日期 1997.01.29
申请号 EP19940116059 申请日期 1994.10.12
申请人 AGFA-GEVAERT AG 发明人 FRASS, WERNER, DR.;GASCHLER, OTFRIED;JOERG, KLAUS, DR.;HULTZSCH, GUENTER, DR.;ELSAESSER, ANDREAS, DR.
分类号 G03F7/00;G03F7/115;(IPC1-7):G03F7/115 主分类号 G03F7/00
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