发明名称 |
Matted radiation-sensitive recording material |
摘要 |
<p>The invention relates to a recording material having a support (carrier, substrate, base), a radiation-sensitive layer containing a 1,2-naphthoquinone 2-diazide and an organic, polymeric binder which is insoluble in water, but soluble in aqueous-alkaline solutions, and a non-continuous matting layer located thereon. This matting layer comprises from 100 to 10000 particles per square centimetre having a mean diameter of less than 40 mu m and a maximum diameter of less than 80 mu m and a mean height from 2 to 6 mu m and a maximum height of 10 mu m which contain a resin containing up to 0.80 mmol of acid and/or salt groups per gram. The matting layer is obtained by spraying on and drying an aqueous, anionically or anionically/nonionically stabilised dispersion of the resin.</p> |
申请公布号 |
EP0649063(B1) |
申请公布日期 |
1997.01.29 |
申请号 |
EP19940116059 |
申请日期 |
1994.10.12 |
申请人 |
AGFA-GEVAERT AG |
发明人 |
FRASS, WERNER, DR.;GASCHLER, OTFRIED;JOERG, KLAUS, DR.;HULTZSCH, GUENTER, DR.;ELSAESSER, ANDREAS, DR. |
分类号 |
G03F7/00;G03F7/115;(IPC1-7):G03F7/115 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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