| 摘要 |
PURPOSE:To improve the radiation sensitivity of a coated film and the resolution of a pattern by incorporating a specified polymer material in the title material. CONSTITUTION:The radiation sensitive polymer material A is composed of a homopolymer of allyl methacrylate or a copolymer of allyl methacrylate and an addition-polymerizable monomer B having CH2=C group. And, the material A is composed of a stereoregular polymer and has preferably a mean mol.wt. of 1,000-1,000,000. And, the component B is preferably composed of a monomer shown by the formula wherein R1 is methyl or ethyl group, etc., R2 is alkyl or aryl group, etc. The pattern is formed by applying a composition contg. a material A as a main component on a prescribed substrate to form a coated film, and then developing the obtd. film after projecting radiation beams. |
