| 摘要 |
PURPOSE: To obtain textiles manifesting interference colors abundant in diversity of changing colors caused from interference of lights by forming photoresist membrane comprising multiple slits having specific pitch and depth and having specific thickness or less on the surface of textile base having specific basis weight or less. CONSTITUTION: The photoresist membrane of thickness <=10μm is formed on the surface of the textile base having basis weight of 60 g/cm<2> preferably comprising filaments by coating a positive type photoresist and heating. Slit pattern having 0.3 to 3μm of pitches, >=0.01 of depth is formed by laminating a photo mask having stripe like slit pattern on the coated surface, irradiating ultraviolet rays and developing. Pattern that color develops by lights interference, changes tone depending on the direction, abundant in diversity is manifested by this method. The feeling and texture or the like of the textile are not damaged because the thickness of the photoresist membrane is <=10μm.
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