METHOD FOR FORMING BY LOW PRESSURE DEPOSITION A LAYER OF INSULATING MATERIAL ON A SUBSTRATE, AND PRODUCT OBTAINED THEREBY

摘要

Treatment of material surfaces. The formation method according to the invention comprises: maintaining in a container an oxidizing medium for the material to be transferred; causing, according to stable parameters, the transfer of material to form on the substrate at least one prelayer having a thickness smaller than that of the insulating layer to be obtained; interrupting the formation of said prelayer; subjecting during a predetermined time duration the deposited atoms or molecules forming the prelayer to an oxidation in order to perfect their chemical binding and their mutual organization ; growing again on the prelayer a layer of insulating material according to the same stable parameters up to the obtention of the desired thickness. Application to the fabrication of electronic components.