发明名称 Electroplating apparatus for plate-shaped workpieces, particularly printed circuit boards
摘要 An electroplating apparatus for plating plate-shaped workpieces, particularly printed circuit boards, as they move in a horizontal path through a tank of electrolyte between an upper anode and a lower anode characterized by the device including four electrolyte headers arranged with a pair at the input of the path between the upper and lower anodes, and a pair at the end of the path between the upper and lower anodes, with each pair having one header disposed above the path and one header disposed below the path. Each of the headers as a plurality of openings extending at an attack angle to the horizontal path to create both horizontal and vertical components for a flow of the electrolyte between the surfaces of the workpieces and each of the upper and lower anodes.
申请公布号 US4832811(A) 申请公布日期 1989.05.23
申请号 US19880147294 申请日期 1988.01.22
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 HOSTEN, DANIEL
分类号 C25D7/00;C25D7/06;H05K3/24 主分类号 C25D7/00
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