| 摘要 |
<p>PURPOSE:To efficiently form a functional deposited film excellent in characteristics by bringing an active species into contact with a precursor produced from a specified halogenosilane compd. in a film formation chamber and furthermore activating the unreacted compd. and producing the precursor. CONSTITUTION:A precursor is produced by activating a hologenosilane compd. shown in the general formulas SiuX2u+2, SivX2v and SiuHxXy (wherein X shows one or more kinds of F, Cl, Br and I, (u) shows integer not less than 1, (v) shows integer not less than 3, x+y=2u or 2u+2). Both this precursor and an active species performing mutual interaction therewith are separately introduced into a film formation space respectively. Therein both are chemically brought into contact with each other and a functional thin film is deposited and formed on a base body arranged to the inside thereof. Furthermore the undecomposed or unactivated halogenosilane compd. discharged from the above- mentioned film formation space is separately activated and the produced precursor is reintroduced into the film formation space. Thereby the functional deposited film excellent in characteristics is formed at good reproducibility with high efficiency while increasing the deposition velocity.</p> |
