| 摘要 |
PURPOSE:To freely carry out a pattern exposure without injuring a mask by specifying a plastic film interposed between a photosensitive resin and the mask. CONSTITUTION:The plastic film which is composed of polymer compd. contg. one or more of fluorine atoms based on the repeating unit of a polymer and has >=30% a light permeability in a wavelength region of 300-500nm, is interposed between the nonsolid photosensitive resin which does not have a dried surface and the mask, and the obtd. laminate is subjected to the irradiation with active energy rays from the upperward of the mask. Thus, even when the gap between the photosensitive resin and the mask is about 10mum at minimum, the pattern exposure can be carried out, without lowering the utility factor of UV rays having a broad wavelength region against the nonsolid photosensitive resin and injuring the mask. |
