发明名称 |
PHOTOSENSITIVE FILM OF A SILICON-CONTAINING POLYMER AND ITS USE AS A MASK IN PHOTOLITHOGRAPHIC PROCESSES |
摘要 |
Photosensitive film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon-containing polymer-based photosensitive film can be used as a masking resin in a lithography process for producing electronic components. |
申请公布号 |
DE3569383(D1) |
申请公布日期 |
1989.05.18 |
申请号 |
DE19853569383 |
申请日期 |
1985.09.17 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
BUIGUEZ, FRANCOIS;GIRAL, LOUIS;ROSILIO, CHARLES;SCHUE, FRANCOIS |
分类号 |
G03C5/00;C08F30/08;G03F7/038;G03F7/039;G03F7/075;G03F7/26;(IPC1-7):C08F30/08;G03F7/10 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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