| 摘要 |
<p>A negative pattern forming material for forming a desired pattern on a substrate with high accuracy and a method for forming a desired pattern on a substrate with high accuracy using the material are disclosed. The material contains as a major component a polyorganosiloxane which is constituted of siloxane units represented by SiO4/2 and at least one organosiloxane unit, contains at least one high-energy ray responsive groupe per molecule, has a softening temperature higher than ordinary temperature, and is solvent-soluble.</p> |
