| 摘要 |
<p>Soluble and/or meltable polyamide-polyamide (PA-PA1), polyamide-polyamideimide (PA-PAI) or polyamide-polyimide (PA-PI) block copolymers of general formula (I) in which n is a whole number from 1 to 200, x is a whole number from 1 to 20, R1 is a divalent aromatic residue, R is the residue of general formula (II) and a) in the case of the PA-PA1 block copolymers, X is the residue -NH-, Y is the residue -NH-CO-, where in each case N is bonded to R and B is a residue of general formula (III), where y is a whole number from 1 to 20, R2 is a divalent aromatic residue and R3 is a divalent aromatic residue different from R, b) in the case of the PA-PAI block copolymers, either: X is the residue = N-, Y is the residue -NH- and B is the residue of general formula (IV), where Ar is a trivalent aromatic residue, or: X and Y are the residue = N- and B is the residue of general formula (V), where Y is a whole number from 0 to 20 and R3 is R or a divalent aromatic residue and Ar is as defined above, c) in the case of the PA-PI block copolymers, X and Y are the residue = N- and B is the residue of general formula (VI), where y is a whole number from 0 to 20 and R3 is R or a divalent aromatic residue and Ar is a tetravalent aromatic residue. Also described is a process for their manufacture.</p> |
