发明名称 PHOTOMASK
摘要 PURPOSE:To enable size measurement which can cover nearly 100% of the regions of patterns by disposing a prescribed circuit pattern to the central part thereof and forming the patterns for size measurement at least at 4 points so as to enclose the prescribed circuit pattern. CONSTITUTION:The patterns 2 for size measurement are disposed at the four ends so as to enclose the chip numbers 41, 42, 43, 44 of the prescribed circuit pattern 1. The patterns are formed by a stepper using this reticle. The sizes of nearly 100% of the regions of the patterns formed by the stepper in such a manner can be measured and since the patterns for the size measurement which exist at the four ends are formed in extreme proximity to each other, the size measurement is executable in the shorter time than in the conventional method.
申请公布号 JPH01124854(A) 申请公布日期 1989.05.17
申请号 JP19870282873 申请日期 1987.11.09
申请人 SEIKO EPSON CORP 发明人 ENDO TOSHIO
分类号 G03F1/00;G03F1/44;H01L21/027;H01L21/66 主分类号 G03F1/00
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