METHOD FOR FORMING MULTI-LAYERED PATTERN OF POLYIMIDE

摘要

PURPOSE:To easily form >=2 layers of patterns with a shorter stage by exposing a 1st photosensitive polyimide film on a substrate to a prescribed pattern shape and forming the 2nd polyimide film thereon, then exposing the same likewise to the pattern shape and subjecting the films to developing and a heat treatment. CONSTITUTION:A photosensitive polyimide soln. is coated on the glass substrate 1 and UV rays are projected through a negative pattern for an oriented film on the 1st layer of the film 2 obtd. by drying the coating to form a latent image 21 of the oriented film pattern. A photosensitive polyimide soln. is in succession coated thereon and is dried to form the 2nd layer of the film 3 for forming spacers and is irradiated with UV rays through a negative pattern for the spacers. The unexposed parts of the photosensitive polyimide films of the 1st layer and the 2nd layer are dissolved by a developing soln. and are subjected to the heat treatment to obtain the oriented polyimide film 21 with the spacers 31. The plural patterns are easily formed in the short stage by constituting the patterns in the above-mentioned manner.