| 摘要 |
PURPOSE:To enable to form the line-like pattern having excellent accuracy in processing by a method wherein an ion beam having the cross section in the shape which is separated by two narrow-widthed non-irradiated regions is used, thereby enabling to unnecesitate to scan a beam while processing work is being done and to cut down the processing time. CONSTITUTION:A long and narrow rectangular aperture 7' is formed on a flat plate 7 consisting of molybdenum, tantalum and the like. Then an aperture, obtained by providing a linear member 7'' consisting of tungsten, gold and the like in the center part of the aperture 7', is provided in an ion-beam irradiating device, and an ion-beam processing is performed. At this time, the measurements of the opening of the aperture and the width of said linear member 7'' to be provided at the aperture are to be properly selected so that they will be fit to the width and the like of the line, and the beam passed through the aperture is re duced to the desired measurements using the electronic optical system such as electronic lens and the like, thereby enabling to accomplish the processing of the linear pattern required. Through these procedures, the irradiation of an ion beam can be accomplished in the form of fixed system, the scanning of beam is performed only in the shifting between patterns, thereby enabling to obtain an excellently accurate pattern without having the adverse effect such as noise and the like which will be inflicted upon the scanning voltage while processing work is performed. |
