| 摘要 |
PURPOSE:To shorten the development time of a photosensitive film and the peeling time of a curing film by using a specific acrylic group resin employing diacetone (metha)acrylic amide as a copolymerization component as a photo- setting resin. CONSTITUTION:An acrylic resin containing a (metha)acryloyl group and using diacetone (metha)acrylic amide as an essential monomer component is employed. A water-soluble or water-dispersing photo-setting unsaturated resin having an acid value of 20-300, the degree of unsaturation of 0.2-4.5mol/kg, number average molecular weight of 1000-100000 and a glass transition temperature of 0-100 deg.C and an water-insoluble photopolymerization initiator are contained. Accordingly, when a formed photosensitive film is exposed through a negative film, an un-exposure section is developed in a short time by weak alkali, and an exposure section can also be dissolved and removed easily in a short time by strong base. |
