| 摘要 |
PURPOSE:To obviate generation of cracks and side etching by forming a specific resin layer on a color filter and forming a transparent conductive film of indium tin oxide (ITO) contg. tin (Sn) thereon. CONSTITUTION:At least one layer of the resin layer 3 consisting of one among a polyimide resin, modified polyimide resin, polyamide resin, modified polyamide resin, polyamic acid resin, modified polyamic acid resin, silicon resin and inorg. resin contg. the silicone as the skeleton is formed on the color filter 2. The ITO is then formed thereon. The cracks and side etching are thereby hardly generated in the color filter 2 and the resin layer 3. |
