| 摘要 |
PURPOSE:To prevent securely developing solution from entering the rear of a substrate by a simple adjustment regardless of the kinds of developing solution, by providing fluid discharge openings in the outside of a rear cleaning nozzle and by attaching a mechanics which sprays fluid to the rear of a substrate being developed. CONSTITUTION:In a spin development device which has a rear cleaning mechanics, fluid discharge openings 9 are provided in the outside of a rear cleaning nozzle 8 and a mechanics which sprays fluid to the rear of a substrate 1 being developed. For instance, compressed air 7 is sprayed from a creeping, prevention nozzle 6 which is fixed in a inner cup 5 onto the rear of the exposed substrate 1 whereon photoresist 2 is applied, to prevent creeping of developing solution 3 from entering. In the creeping prevention nozzle 6, many air discharge openings 9 are shaped to spread compressed air all across the circumferential direction of the substrate 1 even if the substrate 1 is static or rotating slowly. When development is finished, developing solution is eliminated with rinse by rotating the substrate 1, then a small amount of developing solution attached to the rear of the substrate 1 is eliminated by spraying rear cleaning solution from the rear cleaning nozzle 8 onto the rear of the substrate. |
