| 摘要 |
<p>PURPOSE:To cool mask which can be easily affected by an impact due to X-ray heat and to minimize the impact, by providing a temperature sensing element to a mask chucking section or a mask ring, providing Peltier element to the mask ring, and providing a circuit to permit current corresponding to the temperature rise against the standard temperature to flow to Peltier element. CONSTITUTION:A removable mask ring 14 having a mask membrane 15 is attached to a mask chucking section 10. In a semiconductor manufacturing equipment which forms a pattern corresponding to the pattern of the mask membrance 15 into a semiconductor wafer, a temperature sensing element 12 is provided to the mask chucking section 10 or the mask ring 14 and yet Peltier element 17 is provided to the mask ring 14. Circuits 19-21 are also provided which allow current corresponding to the temperature rise against the standard temperature of the mask chucking section 10 or the mask ring 14 detected by the temperature sensing element 12 to flow to Peltier element 17. In this way, heat of the mask membrane by X-ray irradiation is absorbed by Peltier element, and the pattern is kept correctly.</p> |
