PLASMA PROCESSOR

摘要

PROBLEM TO BE SOLVED: To provide a plasma processor capable of maintaining a stable plasma discharge. SOLUTION: The plasma processor for plasma-processing a substrate 7 housed in a process chamber 8 of a vacuum chamber 1 comprises an insulator 10 of a specified width on the top face of a lower electrode 5 insulatively mounted in a base 2 of the chamber 1 forming a gap 9 with the chamber 1 along an entrance of the gap 9. This increases the impedance of the insulator mounting part to suppress the plasma discharge in the gap 9, and stabilize the plasma discharge in the chamber 8 in a plasma process with the plasma discharge generated in the process chamber 8.