| 摘要 |
PURPOSE:To stably perform the formation of ultrafine resist pattern with high contrast and high resolution at high accuracy without lowering throughput by containing a specific photosensitive body, a water soluble polymer and water. CONSTITUTION:A photo-reaction reagent expressed in a formula I is used. In the photo-reaction reagent, its absorption peak is near 430nm and transmittivity on 436nm becomes large after exposure. Since it is solved much in water because of the action of an SO3H radical, initial transmittivity T(o) becomes small and exposure absorption term A value is improved to obtain >=10. It is desirable to use a mixed body of a water soluble organic substance which is excellent in the transmission of gas and a water soluble inorganic substance which is inferior in the transmission of gas as the water soluble polymer in order not to take in foams from a base resist at the time of exposing. Thus, the formation of the ultrafine resist pattern can be stably performed with high contract and high resolution at high accuracy without lowering the throughput. |
