发明名称 PHOTOSENSITIVE POLYMER COMPOSITION
摘要 PURPOSE:To obtain the subject compsn. being capable of giving a high concn. and a low viscosity in a soln. state and giving a final cured film having excellent heat resistance and flexibility, by compounding a polyamic acid contg. an ethylenically unsatd. group of a specified structural unit and a photo-polymn. initiator. CONSTITUTION:A polyamic acid of formula I (wherein R1 is a tetravalent arom. group of formula II; R2 is a divalent arom. group having an ethylenically unsatd. group) by dissolving a diamine contg. an ethylenically unsatd. group (e.g., 4,4'- diaminochalcone) in a polar solvent (e.g., N-methyl-2-pyrrolidone) and reacting p-terphenyl-3,4,3',4'-tetracarboxylic dianhydride therewith. 100pts.wt. this polyamide acid, 0.01-30pts.wt. photo-polymn. initiator (e.g., 2-isopropylthioxanthone) and, if necessary, a sensitizing aid, a thermal polymn. inhibitor etc. are compounded.
申请公布号 JPH01118514(A) 申请公布日期 1989.05.11
申请号 JP19870277741 申请日期 1987.11.02
申请人 HITACHI CHEM CO LTD 发明人 SATO KUNIAKI;KIKUCHI NOBURU;SAITO TAKAYUKI;ISHIMARU TOSHIAKI;KOJIMA YASUNORI;KOJIMA MITSUMASA
分类号 C08G73/10;C08F2/48;C08F290/00;C08F299/02;G03F7/038 主分类号 C08G73/10
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