发明名称 Semiconductor device structure including multiple fets having different spacer widths
摘要 A semiconductor device structure includes at least two field effect transistors formed on same substrate, the first field effect transistor includes a spacer having a first width, the second field effect transistor includes a spacer having a second width, the first width being different than said second width. Preferably, the first width is narrower than the second width.
申请公布号 US6806584(B2) 申请公布日期 2004.10.19
申请号 US20020277907 申请日期 2002.10.21
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FUNG KA HING;GILBERT PERCY V.
分类号 H01L29/41;H01L21/8234;H01L21/8238;H01L27/088;H01L27/092;H01L29/423;H01L29/49;H01L29/78;(IPC1-7):H01L27/088 主分类号 H01L29/41
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