| 摘要 |
PURPOSE:To obtain a position detection reference mark for electron beam keeping a sufficient S/N, by arranging, on a metal thin film having a contact surface with the surface of a body to be treated, a marking metal forming eutectic alloy with the surface of the body to be treated. CONSTITUTION:An insulating film 4 is formed on a substrate 1 to be treated, and a metal thin film 3 is formed so as to cover the insulating film 4 and come into contact with the substrate 1. As a marking metal 2, the same metal with element material is formed on the thin film 3, at the same time with the formation of the element material. Thus, when the surface is scanned by an electron beam 7, the decrease of signal intensity of electron reflected from the metal 2 becomes small, as compared with the case where an electron beam resist 6 does not exist. Thereby obtaining a position detection reference mark keeping a sufficient S/N. |
