发明名称 SECONDARY ION MASS ANALYSIS
摘要 PURPOSE:To attain high sensitivity with a reduction in interference by hydrogenated secondary ions of elements other than those to be analyzed by blowing hydrogen gas onto a sample to utilize the hydrogenated secondary ion positively. CONSTITUTION:A sample 2 is irradiated with a primary ion beam 5 obtained from an ion source 1. A secondary ion 6 released from the sample 2 by irradiation with the primary ion beam 5 is accelerated with a secondary ion extraction electrode 10 and separated with a mass spectrograph 3 to be detected with a secondary ion detector 4. At this point, when a valve 8 is opened, hydrogen gas is blown onto the sample 2 through a gas leak piping 7 from a hydrogen gas cylinder 9, thereby achieving a higher generation ratio of a hydrogenated secondary ion.
申请公布号 JPH01116440(A) 申请公布日期 1989.05.09
申请号 JP19870273241 申请日期 1987.10.30
申请人 NEC CORP 发明人 HOSHINO HITOSHI
分类号 H01J37/20;G01N23/225;H01J49/04 主分类号 H01J37/20
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