COMPOSITION FOR ANTIREFLECTION COATING AND METHOD FOR FORMING PATTERN

摘要

A composition for an antireflection coating which comprises an alkali- soluble fluorine containing polymer, an acid, an amine and a solvent capable of dissolving these chemicals and has a pH of 7 or less. The composition is applied on a chemical amplification photoresist to form an antireflection film. The resultant antireflection film is capable of preventing the multiple reflection within the photoresist film and also enhances the reduction of the thickness of the photoresist film occurring during the development using an alkaline solution after exposure, and thus allows the formation of a pattern having a cross section of a rectangular shape, not of a T-top or round top shape.