| 摘要 |
<p>An exposure apparatus for immersing, in liquid, a space between a final lens of a projection optical system and a plate, and for exposing the plate via the liquid includes a leak reducer for reducing or preventing a leak of the liquid from an area in which the liquid is to be filled between the final lens of the projection optical system and the plate, and a pressure maintainer provided to the leak reducer or provided closer to an optical axis of the projection optical system than the leak reducer, the pressure maintainer restraining a pressure fluctuation of gas in or near the area, wherein both a liquid recovery port for recovering the liquid from the area and a liquid supply port for supplying the liquid to the area are closer to the optical axis of the projection optical system than the leak reducer and the pressure maintainer.</p> |
