SUBSTRATE CLEANING APPARATUS AND CLEANING METHOD THEREOF

摘要

[PROBLEMS] To provide a single-substrate cleaning apparatus which saves space and is low-cost and environment-friendly, and a cleaning method employed in such apparatus. [MEANS FOR SOLVING PROBLEMS] A substrate cleaning apparatus (1) is provided with a rotating table (50) for rotatably holding a silicon substrate; a light irradiation apparatus (30) which can irradiate at least a part of the surface of the silicon substrate being held with light; a nozzle (40) which can selectively supply the substrate with at least a N<SUB>2</SUB>O solution and a hydrofluoric solution; and a control unit which controls supply from the light irradiation apparatus (30) and the nozzle (40) and permits the light irradiation by the light irradiation apparatus (30) when the silicon substrate is supplied with the N<SUB>2</SUB>O solution.