发明名称 Method for manufacturing a shadow mask.
摘要 <p>A shadow mask is formed by forming two photosensitive resin layers respectively on both major surfaces of a band-like metal sheet (1). The first resin layer is formed by coating a resin solution (13) on the first major surface with the first major surface directed upward, and drying the solution while maintaining the metal sheet (1) horizontal. Likewise, the second resin layer is formed by coating a resin solution (23) of the second major surface with the second major surface directed upward, and drying the solution while maintaining the metal sheet (1) horizontal. Predetermined openings are made in the first and second resin layers by exposing and developing. Then, the bared portions of metal sheet are etched to form apertures therein.</p>
申请公布号 EP0314110(A2) 申请公布日期 1989.05.03
申请号 EP19880117855 申请日期 1988.10.26
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SAGOU, SEIJI C/O PATENT DIVISION;OHTAKE, YASUHISA C/O PATENT DIVISION
分类号 B05C9/04;H01J9/14 主分类号 B05C9/04
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