发明名称 |
Formation of variable-width sidewall structures. |
摘要 |
<p>Spacers are formed having widths that vary as a function of the spacing between the mandrels upon which the conformal material that defines the spacers is deposited and etched. As the spacing between adjacent mandrels decreases, the width of the resulting spacers decreases. The correlation between mandrel spacing and sidewall structure width is independent of the thickness of the conformal material as-deposited. As the spacing between the mandrels decreases, the decrease in width becomes more pronounced, particularly at mandrel spacings of five microns or less. Thus, by making adjacent mandrels closer together or further apart and adjusting mandrel height, active/passive components having differing widths/lengths may be formed from the same conformal layer.</p> |
申请公布号 |
EP0313815(A2) |
申请公布日期 |
1989.05.03 |
申请号 |
EP19880115531 |
申请日期 |
1988.09.22 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BHATTACHARYYA, ARUP;KERBAUGH, MICHAEL, L.;ROBINSON, JEFFREY A.;QUINN, ROBERT M. |
分类号 |
H01L21/302;H01L21/027;H01L21/033;H01L21/28;H01L21/3065;H01L21/3213 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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