| 发明名称 |
Process for removing contaminant. |
| 摘要 |
<p>Contaminant is removed from the interior of the holes in the vicinity of preselected locations by etching in a gaseous plasma wherein the sheath voltage is controlled in order to direct ions of the plasma to contact the interior of the holes in the vicinity of the preselected locations.</p> |
| 申请公布号 |
EP0313855(A2) |
申请公布日期 |
1989.05.03 |
| 申请号 |
EP19880116159 |
申请日期 |
1988.09.30 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
MLYNKO, WALTER E. |
| 分类号 |
B08B7/00;C23F4/00;H05K3/00;H05K3/26;H05K3/42 |
主分类号 |
B08B7/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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