METHOD OF PRODUCING DEVICES USING NONPLANAR LITHOGRAPHY

摘要

A new method for fabricating a device lithographically patterning nonplanar substrates. In accordance with this method, a nonplanar substrate surface is patterned by initially substantially conformably coating the surface with a resist. Conformality is achieved by depositing the resist either from the vapor phase or from a mist. In addition, the motions of the constituents of the vapor or mist should be sufficiently random so that the angular flux distribution at any point on the nonplanar substrate surface to be coated is substantially identical to that at any other point to be coated.