发明名称 Organic sidewall structures.
摘要 <p>A conformal organic layer is used to define spacers on the sidewalls of an organic mandrel. The organic layer (e.g., parylene) can be deposited at low temperatures, and as such are compatible with temperature-sensitive mandrel materials that reflow at high deposition temperatures. The conformal organic material can be dry etched as the same rate as the organic mandrels, while being resistant to wet strip solvents that remove the organic mandrels. This series of etch characteristics make the organic mandrel-organic spacer combination compatible with a host of masking applications.</p>
申请公布号 EP0313814(A2) 申请公布日期 1989.05.03
申请号 EP19880115530 申请日期 1988.09.22
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 COTE, WILLIAM J.;KERBAUGH, MICHAEL L.;KENNEY, DONALD M.;LEACH, MICHAEL A.;ROBINSON, JEFFREY A.;SWEETSER, ROBERT W.
分类号 H01L21/302;H01L21/027;H01L21/3065;H01L21/311 主分类号 H01L21/302
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