发明名称 PHOTOMASK
摘要 PURPOSE:To minimize an error at the time of changing a unit from a unit of mil to a unit of mum without increasing the size of a chip by setting the chip sizes of two sides of the outer sides of a rectangular semiconductor device defined on a photomask. CONSTITUTION:When a size unit mil represented in an inch system is converted to the unit of mum in a meter system, a rounding error is generated. For example, in a 4-chip reticule, the photomask is formed by a semiconductor device area 1, a scribe line area 2, and a light shielding body area 3. Assuming the size of a horizontal direction in a rectangle forming the chip as X and that of a vertical direction as Y, relation X=x+a/2, and Y=y+a/2 can be established. In such a case, a coefficient 25.4 exists when the sizes X and Y are converted from the unit of mil of the inch system to the unit of mum of the meter system. Therefore, by setting the sizes X and Y at 5mil unit, a decimal place is eliminated and it goes to an integer, therefore, the rounding error can be reduced.
申请公布号 JPH01113754(A) 申请公布日期 1989.05.02
申请号 JP19870270736 申请日期 1987.10.27
申请人 SEIKO EPSON CORP 发明人 YAMADA MASAHIRO
分类号 G03F1/00;H01L21/02;H01L21/027;H01L21/30 主分类号 G03F1/00
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