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发明名称
Chemical vapor deposition apparatus having an ejecting head for ejecting a laminated reaction gas flow
摘要
申请公布号
US4825809(A)
申请公布日期
1989.05.02
申请号
US19880163733
申请日期
1988.03.03
申请人
FUJITSU LIMITED
发明人
MIENO, FUMITAKE
分类号
C30B25/14;C23C16/44;C23C16/455;C30B29/06;H01L21/205;(IPC1-7):C23C16/44
主分类号
C30B25/14
代理机构
代理人
主权项
地址
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