| 摘要 |
<p>PURPOSE:To prevent the occurrence of electrostatic destruction in the main pattern of a mask part by limiting the exposure area of step exposure to the range of a metallic film and continuously leaving the metallic film throughout around a mask part forming area. CONSTITUTION:An exposure area 50 of step exposure is limited to the range of a metallic film 22, and metallic films 22 and 63 are so constituted that they are continuously left throughout around a mask part forming area 61. That is, the metallic film left throughout around the mask forming area charges most of static electricity during the production process to relatively suppresses charging of static electricity to each mask part. Thus, the conventional production process is followed as it is to produce a photomask without causing electrostatic destruction of the main pattern.</p> |
