发明名称 PHOTOSENSITIVE COMPOSITION CONTAINING ORGANIC FINE PARTICLES
摘要 This invention provides a photosensitive composition, which has low light scattering loss and can permanently form a hologram with high diffraction efficiency, and a method for pattern formation using the composition. The photosensitive composition is used for pattern formation by pattern-wise exposure and is characterized by comprising (a) a polymerizable compound, (b) a photopolymerization initiator, and (c) organic fine particles.
申请公布号 KR20070112866(A) 申请公布日期 2007.11.27
申请号 KR20077023910 申请日期 2007.10.18
申请人 NATIONAL UNIVERSITY CORPORATION THE UNIVERSITY OFELECTRO-COMMUNICATIONS;NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 TOMITA YASUO;FURUSHIMA KOUJI;AKIMOTO KAZUHIKO;CHIKAMA KATSUMI;HIDAKA MOTOHIKO;ODOI KEISUKE
分类号 G03F7/028 主分类号 G03F7/028
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