| 摘要 |
An atmospheric pressure plasma processing apparatus is provided to perform continuously an etch process, a cleaning process, and an ashing process by using plasma. An atmospheric pressure plasma processing apparatus includes a transferring unit for transferring a substrate and a plasma processing unit(120) installed on a substrate transferring path of the transferring unit. The plasma processing unit includes a plasma unit for providing plasma onto a surface of the substrate to be transferred by the transferring unit, and a heating unit for heating the substrate before providing the plasma onto the surface of the substrate. The plasma processing unit includes an upper body and a lower body. Substrate inlet/outlets are formed at both ends between the upper body and the lower body. A substrate transferring path is formed to heat the substrate and to perform a plasma process.
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