发明名称 BISAZIDE COMPOUND AND PHOTOSENSITIVE POLYMER COMPOSITION CONTAINING SAID COMPOUND
摘要 NEW MATERIAL:A bisazide compound. EXAMPLE:2,6-Bis(4-azido-1-naphthylmethylene)-4-methylcyclohexanone. USE:A material for forming fine patterns for photoresists having high sensitivity within a long wavelength region. PREPARATION:4-Azido-1-naphthaldehyde and ketones (e.g., 4-methylcyclohexa none) or diamines (e.g., ethylenediamine hydrate) are subjected to condensation reaction. Furthermore, the ketones are used in an amount of preferably 0.4-0.6mol. based on 1mol. 4-azido-1-naphthaldehyde.
申请公布号 JPH01110566(A) 申请公布日期 1989.04.27
申请号 JP19870269546 申请日期 1987.10.26
申请人 UBE IND LTD 发明人 SHIOTANI AKINORI;OKIMOTO KIYOMI;NISHIO KAZUAKI
分类号 C09B57/00;G03F7/008 主分类号 C09B57/00
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