| 发明名称 |
Composition for semiconductor element protective film. |
| 摘要 |
<p>A composition comprising a polyamide-acid, an organic polar solvent and a special ketone as a solvent is suitable for forming a protective film or semiconductor elements and excellent in wetting and spreading properties with excellent adhesiveness.</p> |
| 申请公布号 |
EP0313401(A2) |
申请公布日期 |
1989.04.26 |
| 申请号 |
EP19880309949 |
申请日期 |
1988.10.21 |
| 申请人 |
HITACHI CHEMICAL CO., LTD. |
发明人 |
SEKINE, HIROYOSHI;SUZUKI, HIROSHI |
| 分类号 |
C08L79/08;C08K5/07;C09D179/08;H01L23/29;H01L23/31;H01L23/556 |
主分类号 |
C08L79/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
