发明名称 THIN FILM RESISTANCE ELEMENT
摘要 <p>PURPOSE:To improve the reliability of laser-trimming and utilize a space efficiently by a method wherein a recessed part protruding inward is provided in a resistance discrete adjustment pattern. CONSTITUTION:A resistance discrete adjustment pattern 4A which has a recessed part 4a protruding inward as a part to be cut off and a resistance non- adjustment pattern 5A are connected in parallel to each other to form a resistor adjustment pattern 6A. A number of the resistor adjustment patterns 6A are connected in series between conductor patterns 2 and 3 which are resistance measurement terminals of the resistor adjustment patterns. The discrete adjustment pattern 4A and the non-adjustment pattern 5A are formed by, for instance, patterning a metel thin film made of platinum or the like by a method such as photoetching. The patterns 4A and 5A are so formed as to make the respective pattern widths equal to each other and the respective pattern lengths (resistance values) different from each other, i.e., to make the resistance of the discrete adjustment pattern 4A larger and the resistance of the non-adjustment pattern 5A smaller. The pattern 4A has protruding parts 4b and 4c and the protruding part 4b is cut off at its two positions by one shortdistance scanning of a laser beam continuously.</p>
申请公布号 JPH01108702(A) 申请公布日期 1989.04.26
申请号 JP19870265355 申请日期 1987.10.22
申请人 YAMATAKE HONEYWELL CO LTD 发明人 NISHIMOTO IKUO;TANAKA SHUICHI;YAMAMOTO TOMOSHIGE;OSADA MITSUHIKO
分类号 H01C17/24;H01C7/00 主分类号 H01C17/24
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